Ref HAL: hal-00390128_v1
PMID 21794190
DOI: 10.1007/s11671-007-9080-6
WoS: 000253655600003
Exporter : BibTex | endNote
15 Citations
Résumé:

We present a study by transmission electron microscopy (TEM) of the strain state of individual InN quantum dots (QDs) grown on GaN substrates. Moire fringe and high resolution TEM analyses showed that the QDs are almost fully relaxed due to the generation of a 60 degrees misfit dislocation network at the InN/GaN interface. By applying the Geometric Phase Algorithm to plan-view high-resolution micrographs, we show that this network consists of three essentially non-interacting sets of misfit dislocations lying along the angle(1) over bar2 (1) over bar0 > directions. Close to the edge of the QD, the dislocations curve to meet the surface and form a network of threading dislocations surrounding the system.