Auteur(s): Darakchieva V., Xie M. -Y., Rogalla D., Becker H. -W., Lorenz K., Alves E., Ruffenach S., Moret M., Briot O.
Conference: ISGN3 (, FR, 2010-07-04)
Actes de conférence: Physica Status Solidi A, vol. 208 p.1179-1182 (2011)
Texte intégral en Openaccess : 
Ref HAL: hal-00633877_v1
DOI: 10.1002/pssa.201001151
WoS: 000290630200030
Exporter : BibTex | endNote
7 Citations
Résumé:
In this work we present a comprehensive study on the hydrogen impurities, free electron, and structural properties of MOVPE InN films with state-of-the-art quality. We find a correlation between the decrease of free electron concentration and the reduction of bulk hydrogen in the films upon thermal annealing, while no changes in the dislocation densities and strain are observed. Our results suggest that hydrogen is a major source for the unintentional n-type doping in MOVPE InN. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim