Ref HAL: hal-01974125_v1
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In this communication, we will illustrate how Raman spectroscopy can be used tostudy the doping of graphene. We will first report data recorded by in situ Ramanexperiments on single-layer (SLG) graphene during exposure to rubidium vapor. Bythis way, we have been able to follow continuously the changes of the G and 2Dbands features over a broad doping range (up to about 1014 electrons/cm2). Previoustheoretical predictions have shown that the evolution of the G-mode in SLG resultsfrom the competition between adiabatic and non-adiabatic effects. We emphasizethat a possible substrate pinning effect, which inhibits the charge-induced latticeexpansion of graphene layer, can strongly influence the G band position [1].In the second part, we will show that the charge carrier density of grapheneexfoliated on a SiO2/Si substrate can be finely and reversibly tuned between electronand hole doping with visible photons. This photo-induced doping happens undermoderate laser power conditions but is significantly affected by the substratecleaning method. In particular, it requires hydrophilic substrates and vanishes forsuspended graphene. These findings also suggest that Raman spectroscopy is notalways as non-invasive as generally assumed [2].Finally, we will discuss how these results can be useful to extract information aboutgraphene doping and strain from Raman measurements.References[1] R. Parret, M. Paillet, J.-R. Huntzinger, D. Nakabayashi, T. Michel, A. Tiberj, J.-L.Sauvajol, A.-A. Zahab, ACS Nano, 7 (2013) 165.[2] A. Tiberj, M. Rubio-Roy, M. Paillet, J.-R. Huntzinger, P. Landois, M. Mikolasek, S.Contreras, J.-L. Sauvajol, E. Dujardin, A.-A. Zahab, Scientific Reports, 3 (2013)2355.

Ref HAL: hal-01936666_v1
DOI: 10.4028/www.scientific.net/MSF.806.51
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Raman Investigation of Heavily Al Doped 4H-SiC Layers Grown by CVD

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Ref HAL: hal-00989884_v1
DOI: 10.1038/srep02355
WoS: 000322698700005
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66 Citations
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The ultimate surface exposure provided by graphene monolayer makes it the ideal sensor platform but also exposes its intrinsic properties to any environmental perturbations. In this work, we demonstrate that the charge carrier density of graphene exfoliated on a SiO2/Si substrate can be finely and reversibly tuned between hole and electron doping with visible photons. This photo-induced doping happens under moderate laser power conditions but is significantly affected by the substrate cleaning method. In particular, it requires hydrophilic substrates and vanishes for suspended graphene. These findings suggest that optically gated graphene devices operating with a sub-second time scale can be envisioned and that Raman spectroscopy is not always as non-invasive as generally assumed.

Ref HAL: hal-00989874_v1
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Abstract In this communication, we will illustrate how Raman spectroscopy can be used to study the doping of graphene. We will first report data recorded by in situ Raman experiments on single-layer (SLG) graphene during exposure to rubidium vapor. By this way, we have been able to follow continuously the changes of the G and 2D bands features over a broad doping range (up to about 1014 electrons/cm2). Previous theoretical predictions have shown that the evolution of the G-mode in SLG results from the competition between adiabatic and non-adiabatic effects. We emphasize that a possible substrate pinning effect, which inhibits the charge-induced lattice expansion of graphene layer, can strongly influence the G band position [1]. In the second part, we will show that the charge carrier density of graphene exfoliated on a SiO2/Si substrate can be finely and reversibly tuned between electron and hole doping with visible photons. This photo-induced doping happens under moderate laser power conditions but is significantly affected by the substrate cleaning method. In particular, it requires hydrophilic substrates and vanishes for suspended graphene. These findings also suggest that Raman spectroscopy is not always as non- invasive as generally assumed [2]. References [1] R. Parret, M. Paillet, J.-R. Huntzinger, D. Nakabayashi, T. Michel, A. Tiberj, J.-L. Sauvajol, A.-A. Zahab, ACS Nano, 7 (2013) 165. [2] A. Tiberj, M. Rubio-Roy, M. Paillet, J.-R. Huntzinger, P. Landois, M. Mikolasek, S. Contreras, J.-L. S!auvajol, E. Dujardin, A.-A. Zahab, Scientific Reports, 3 (2013) 2355.

Ref HAL: hal-01936833_v1
DOI: 10.1002/pssb.201200508
WoS: 000318791900017
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Pressure studies of multicarrier conduction in undoped InN grown on GaN buffer

Ref HAL: hal-01208523_v1
DOI: 10.1063/1.4813220
WoS: WOS:000321761600027
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We report magnetotransport measurements performed on AlGaN/GaN devices with different buffer layers. Standard samples with a 1 μm thick GaN buffer show a linear Hall resistance and an almost constant magnetoresistance, as expected from a single two-dimensional electron gas (2DEG) at the AlGaN/GaN interface. Other samples, with an Al x Ga1– x N buffer (x = 5%) and a buried linear aluminium gradient, have an additional three-dimensional electron slab (3DES) close to the GaN substrate. In this case, the Hall resistance is strongly non-linear and presents an incorrect hole-type carrier signature, evidenced by low field mobility spectrum analysis. This effect is strengthened when the 3D layer, parallel to the mesa-etched 2DEG, is infinite. We suggest that the misplacement of the electrical contacts in the 3DES, i.e., far from the sample edges, could explain the wrong carrier type determination.

Commentaires: The authors would like to thank Dr. E. Litwin-Staszewska from the Institute of High Pressure Physics “Unipress,” for the Hall bar processing on the 3D electron slab. This work was supported by the GANEX program (ANR-11-LabEx-0014).