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It is now established that low-temperature grown buffer layers are needed to improve the structural and electronic properties of GaN layers grown on sapphire. We studied the recrystallization of AIN buffer layers grown by low-pressure MOVPE as a function of annealing time. The Warren-Averbach method was applied to the analysis of broadening and line shape of the (0 0 0 2) and (0 0 0 4) X-ray diffraction peaks. This method yielded a separation of the grain size distribution from microstrain effects. The evolution of the relative frequency distribution of the grain size with annealing is correlated with atomic force microscopy experiments. The distribution of the reflecting-planes orientation was determined by X-ray rocking-curve experiments, (C) 1998 Elsevier Science B.V. All rights reserved.