In this work, InGaN/GaN Multi-Quantum Wells (MQWs) with strain compensating AlGaN interlayers grown by metalorganic vapour phase epitaxy have been investigated by high resolution X-ray diffraction, transmission electron microscopy and photoluminescence (PL). For different AlGaN strain compensating layer thicknesses varying from 0 to 10.6 nm, a detailed X-ray diffraction analysis shows that the MQW stack become completely strained on GaN along a and c. The compensation is full from an AlGaN layer thickness of 5.2 nm, and this does not change up to the largest one that has been investigated. In this instance, the AlGaN was grown at the same temperature as the GaN barrier, on top of a protective 3 nm GaN. It is found that the crystalline quality of the system is progressively degraded when the thickness of the AlGaN interlayer is increased through strain concentrated domains which randomly form inside the 3 nm GaN low temperature layer. These domains systematically contribute to a local decrease of the QW thickness and most probably to an efficient localisation of carriers. Despite these defects, the PL is highly improved towards the red wavelengths and compares with the reports on ultrathin AlGaN layers where this has been correlated to the improvement of the crystalline quality although with less strain compensation.

AlGaN based light emitting diodes (LEDs) will play a key role for the development of applications in the ultra-violet (UV). In the UVB region (280–320 nm), phototherapy and plant lighting are among the targeted uses. However, UVB LED performances still need to be improved to reach commercial markets. In particular, the design and the fabrication process of the active region are central elements that affect the LED internal quantum efficiency (IQE). We propose the use of nanometer-sized epitaxial islands (i.e., so called quantum dots (QDs)) to enhance the carrier localization and improve the IQE of molecular beam epitaxy (MBE) grown UVB LEDs using sapphire substrates with thin sub-μm AlN templates. Taking advantage of the epitaxial stress, AlGaN QDs with nanometer-sized (≤10 nm) lateral and vertical dimensions have been grown by MBE. The IQE of the QDs has been deduced from temperature dependent and time resolved photoluminescence measurements. Room temperature IQE values around 5 to 10% have been found in the 290–320 nm range. QD-based UVB LEDs were then fabricated and characterized by electrical and electroluminescence measurements. On-wafer measurements showed optical powers up to 0.25 mW with external quantum efficiency (EQE) values around 0.1% in the 305–320 nm range.

Chirality, a foundational concept throughout science, may arise at ferromagnetic domain walls1 and in related objects such as skyrmions2. However, chiral textures should also exist in other types of ferroic materials, such as antiferromagnets, for which theory predicts that they should move faster for lower power3, and ferroelectrics, where they should be extremely small and possess unusual topologies4,5. Here, we report the concomitant observation of antiferromagnetic and electric chiral textures at domain walls in the room-temperature ferroelectric antiferromagnet BiFeO3. Combining reciprocal and real-space characterization techniques, we reveal the presence of periodic chiral antiferromagnetic objects along the domain walls as well as a priori energetically unfavourable chiral ferroelectric domain walls. We discuss the mechanisms underlying their formation and their relevance for electrically controlled topological oxide electronics and spintronics.