Effect of Temperature on Electrical Transport Properties of MBE grown Mg-doped GaN and AlGaN

Photoluminescence study of Mg-doped GaN and AlxGa1-xN (x<0.4) grown by molecular epitaxy

We investigate the optical properties of porous GaN films of different porosities, focusing on the behaviors of the excitonic features in time-integrated and time-resolved photoluminescence. A substantial enhancement of both excitonic emission intensity and recombination rate, along with insignificant intensity weakening under temperature rise, is observed in the porous GaN films. These observations are in line with (i) the local concentration of electric field at GaN nanoparticles and pores due to the depolarization effect, (ii) the efficient light extraction from the nanoparticles. Besides, the porosification enlarges the surface of the air/semiconductor interface, which further promotes the extraction efficiency and suppresses non-radiative recombination channels. Our findings open a way to increasing the emission efficiency of nanophotonic devices based on porous GaN.

We study the optical properties of MoS2 nanotubes (NTs) with walls comprising dozens of monolayers. We reveal strong peaks in micro-photoluminescence (l-PL) spectra when detecting the light polarized along the NT axis. We develop a model describing the optical properties of the nanotubes acting as optical resonators which support the quantization of whispering gallery modes inside the NT wall. The experimental observation of the resonances in l-PL allows one to use them as a contactless method of the estimation of the wall width. Our findings open a way to use such NTs as polarization-sensitive components of nanophotonic devices.

AlN epilayer properties (120 nm thick) grown by ammonia assisted molecular beam epitaxy on c-sapphire substrates with different low temperature AlN buffer layers (LT-BL) have been studied. The role of the LT-BL on the AlN structural and optical properties was investigated as a function of the LT-BL thickness and growth temperature. Optimum growth conditions were identified with LT-BL thickness of 3 nm and growth temperature between 480 degrees C and 520 degrees C. It was shown that by optimizing these conditions, a reduction of both mixed and edge threading dislocation densities up to 75% is achieved. The impact of the growth temperature of the AlN epilayer was also studied showing an additional improvement of the AlN crystal and morphological properties while growing at higher temperature. A correlation between the epilayer strain and the PL emission was also investigated. Finally, an Al0.7Ga0.3N:Si doped layer was grown on the top of the optimized AlN template showing a smooth surface with monoatomic steps and a roughness similar to 0.2 nm, confirming the potential of such templates for the fabrication of AlGaN based heterostructures.

Ultra-violet (UV) light emitting diodes (LEDs) using III-N quantum dot (QD) active regions have been fabricated by molecular beam epitaxy on (0001)-oriented sapphire substrates. By using the epitaxial compressive stress between the QD material and the template/barrier layers, leading to a 2D-3D growth mode transition, self-assembled QDs with a nominal Al composition of 10% and 20% have been fabricated on A(10.6)Ga(0.4)N. Atomic force microscopy and transmission electron microscopy measurements show high QD densities, ranging between 2 x 10(11)-5 x 10(11) cm(-2), and height and diameter distributions between 1.5-3 nm and 5-20 nm. LED structures including two different AlyGa1-yN/Al0.6Ga0.4N (0001) QD active regions have then been fabricated and processed using a standard planar geometry and squared mesa structures. Current voltage characteristics and electroluminescence (EL) measurements have been performed at room temperature. In particular, the EL properties are investigated in terms of spectral range and wavelength shift as a function of the injection current density. Typically, an emission between 325 and 335 nm is obtained for Al0.2Ga0.9N QDs and between 305 and 320 nm for Al0.2Ga0.8N QDs. The LED characteristics (EL wavelength and broadening) are then correlated to the QD structural properties and the results, supported by calculations, show the main influence of the QD height dispersion and composition fluctuations. Finally, the light output intensity variation as a function of the injection current density has also been investigated and is discussed in terms of injection and recombination mechanisms in the devices.

We report on the controlled growth of h-BN/graphite by means of molecular beam epitaxy. X-Ray photoelectron spectroscopy suggests the presence of an interface without any reaction or intermixing, while the angle resolved photoemission spectroscopy (ARPES) measurements show that the h-BN layers are epitaxially aligned with graphite. A well-defined band structure is revealed by ARPES measurements, reflecting the high quality of the h-BN films. The measured valence band maximum located at 2.8 eV below the Fermi level reveals the presence of undoped h-BN films (band gap similar to 6 eV). These results demonstrate that, although only weak van der Waals interactions are present between h-BN and graphite, a long range ordering of h-BN can be obtained even on polycrystalline graphite via van der Waals epitaxy, offering the prospect of large area, single layer h-BN