AlGaN based light emitting diodes (LEDs) will play a key role for the development of applications in the ultra-violet (UV). In the UVB region (280–320 nm), phototherapy and plant lighting are among the targeted uses. However, UVB LED performances still need to be improved to reach commercial markets. In particular, the design and the fabrication process of the active region are central elements that affect the LED internal quantum efficiency (IQE). We propose the use of nanometer-sized epitaxial islands (i.e., so called quantum dots (QDs)) to enhance the carrier localization and improve the IQE of molecular beam epitaxy (MBE) grown UVB LEDs using sapphire substrates with thin sub-μm AlN templates. Taking advantage of the epitaxial stress, AlGaN QDs with nanometer-sized (≤10 nm) lateral and vertical dimensions have been grown by MBE. The IQE of the QDs has been deduced from temperature dependent and time resolved photoluminescence measurements. Room temperature IQE values around 5 to 10% have been found in the 290–320 nm range. QD-based UVB LEDs were then fabricated and characterized by electrical and electroluminescence measurements. On-wafer measurements showed optical powers up to 0.25 mW with external quantum efficiency (EQE) values around 0.1% in the 305–320 nm range.

Hexagonal boron nitride (hBN) is an important insulator that is incorporated into numerous 2D electronic, optoelectronic, and photonic devices, whereas natural hBN is a mixture of 20% 10B and 80% 11B isotopes, and monoisotopic hBN is a variant with just a single boron isotope, either 10B or 11B. Consequently, monoisotopic hBN has a higher thermal conductivity and a stronger neutron absorption (in the case of h10BN), making it superior for neutron detectors, heat management materials in nano flexible electronic devices, and phonon polariton-based nanophotonics. Here we synthesized approximately monoisotopic hBN using boron powder containing a single boron isotope and nitrogen, and grew single crystals from a Fe–Cr metal flux at atmospheric pressure. Narrow Raman peaks from the shear (r1.3 cm

we report the development of a scanning confocal microscope dedicated to photoluminescence in the 200 nm-wavelength range for samples at cryogenic temperatures (5-300K). We demonstrate the performances of our deep ultraviolet cryomicroscope in high- quality hexagonal boron nitride (hBN) crystals, although it can be utilized for biological studies in its range of operating wavelengths. From the mapping of the photoluminescence, we bring evidence for the suppression of extrinsic recombination channels in regions free from defects. The observation of emission spectra dominated by intrinsic recombination processes was never reported before in hBN, by means of photoluminescence spectroscopy. We show that photoluminescence tomography now competes with cathodoluminescence, and that deep ultraviolet cryomicroscopy by photoluminescence is a novel powerful tool in materials science applications, with the great advantage of an efficient non-invasive photo- excitation of carriers.

Hexagonal boron nitride (hBN) is attracting much attention due to its tremendous applications including nanophotonic and electronic devices, substrates for two-dimensional (2D) materials, heat management materials, etc. To achieve the best device performance, large area hBN single crystals are required. Herein, large area (>500 microns each) high-quality (defect density < 0.52/μm2) bulk hBN single crystals are grown from molten metal solutions with a temperature gradient. The narrow Raman linewidths of the intralayer E2g mode peak and the interlayer shear mode, the strong and sharp phonon-assisted transition photoluminescence peaks, and the high thermal conductivity demonstrate that the hBN produced by this method are high crystal quality with a low density of defects. Atomic force microscope images show that atomically flat layers of hBN can be produced by exfoliation. This study not only demonstrates a new strategy for growing large hBN single crystals, but also provides high quality thick and thin hBN layers for nano device applications

AlyGa1−yN quantum dots (QDs) have been grown by molecular beam epitaxy on AlxGa1−xN (0001) using a 2-dimensional–3-dimensional growth mode transition that leads to the formation of QDs. QDs have been grown for Al compositions y varying between 10% and 40%. The influence of the active region design [composition y, QD height, and bandgap difference (ΔEg) between the AlxGa1−xN cladding layer and the AlyGa1−yN QDs] is discussed based on microscopy, continuous wave photoluminescence (PL), and time-resolved PL (TRPL) mea- surements. In particular, increasing y leads to a shift of the QD emission toward shorter wavelengths, allowing covering a spectral range in the UV from 332 nm (UVA) to 276 nm (UVC) at room temperature (RT). The low-temperature (LT) internal quantum efficiency of the QD ensembles was estimated from TRPL experiments at 8 K and values between 11% and 66% were deduced. The highest internal quantum efficiency (IQE)-LT is found for the QDs with higher Al content y. Then, the PL spectrally integrated intensity ratios between RT and LT were measured to estimate the IQE of the samples at RT. The PL ratio is higher for larger ΔEg, for QDs with y of 0.1 or 0.2, and high PL intensity ratios up to 30% were also measured for QDs with larger y of 0.3 and 0.4. RT IQE values between 5% and 20% are deduced for AlyGa1−yN QDs emitting in the 276–308 nm range.

We study shallow and deep levels in carbon-doped hexagonal boron nitride crystals precipitated from a molten metal solution in a high-temperature furnace. Reflectance and photoluminescence under deep ultraviolet excitation are complemented by spatially resolved experiments by means of a scanning confocal micro-photoluminescence setup operating in the ultraviolet. Isotopically controlled carbon doping does not induce any energy shift of the well-known deep-level emission at 4.1 eV. Our detailed characterization in a series of carbon-doped crystals reveals that the incorporation of carbon during the growth process results in a distinct class of shallow and deep levels in hexagonal boron nitride, calling into question the exact role of carbon in the growth of hexagonal boron nitride and its direct or indirect influence on the formation of the crystal defects.

Hexagonal boron nitride is a large band-gap insulating material which complements the electronic and optical properties of graphene and the transition metal dichalcogenides. However, the intrinsic optical properties of monolayer boron nitride remain largely unex- plored. In particular, the theoretically expected crossover to a direct-gap in the limit of the single monolayer is presently not confirmed experimentally. Here, in contrast to the tech- nique of exfoliating few-layer 2D hexagonal boron nitride, we exploit the scalable approach of high-temperature molecular beam epitaxy to grow high-quality monolayer boron nitride on graphite substrates. We combine deep-ultraviolet photoluminescence and reflectance spectroscopy with atomic force microscopy to reveal the presence of a direct gap of energy 6.1eV in the single atomic layers, thus confirming a crossover to direct gap in the monolayer limit.